
ʻIke ʻia hoʻi he ipu hoʻoheheʻe corundum, ʻike ʻia ka ipu hoʻoheheʻe alumina e kona ʻike alumina kiʻekiʻe, maʻamau mai 95% a 99%. Hiki iā ia ke hana mau ma 1650°C, me ka mahana lawelawe kiʻekiʻe loa a hiki i 1800°C. He loea kā mākou hui i ka hana ʻana i nā ipu hoʻoheheʻe nui i hana ʻia e hoʻokō i nā koi kikoʻī ʻole.
| ʻAno Paukūʻolokaʻa Alumina | ||||
| Ka Diameter Luna (mm) | Ka Dia o lalo (mm) | Kiʻekiʻe (mm) | Mānoanoa (mm) | Ka nui (ml) |
| 50-100 | 50-100 | 35-116 | 3 | 5-5000 |
| ʻAno Huinahā o ka ipu hoʻoheheʻe alumina | ||||
| Ka lōʻihi (mm) | Ka laulā (mm) | Kiʻekiʻe (mm) | Mānoanoa (mm) | Ka nui (ml) |
| 60-200 | 30-150 | 15-190 | 3 | 5-5000 |
| Nānā: Loaʻa nā nui i hoʻopilikino ʻia ma ke noi. | ||||
| Nā Waiwai Keramika | ʻO ka Semiconductor Seramika Alumina | ||
| Hoʻonohonoho Nui | Al2O3≥99% | Al2O3≥95% | ZrO2≥94% |
| Ka nui (g/cm³) | 3.85 | 3.6 | 5.9 |
| Ka omo ʻana o ka wai (%) | 0 | 0 | 0 |
| Mahana Sintering (°C) | 1690 | 1670 | 1650 |
| Paʻakikī (HV) | 1700 | 1600 | 1400 |
| Ikaika Flexural 4pt (MPa) | >3500 | >2900 | >11000 |
| Ikaika Hoʻopaʻa (Kgf/cm²) | 30000 | 25000 | 25000 |
| Mahana Hana Kiʻekiʻe Loa (°C) | 1500 | 1400 | 1600 |
| Ka helu hoʻonui wela (10⁻⁶/°C) (0-1000°C) | 8 | 7.8 | 10 |
| Ke kū'ē ʻana i ka haʻalulu wela T (°C) | 200 | 220 | 350 |
| Ka Hoʻokele Wela (W/m·K) | 31 | 22 | 3 |
| Ke kū'ē ʻana o ka leo (Ω·cm) | >10¹² | >10¹² | >10¹² |
| Ikaika Dielectric (KV/mm) | 18 | 16 | 15 |
| Paʻa Dielectric (1MHz) | 9.2-10.5 | 9.0-10 | 12.5 |
| Nā noi | ʻO nā ʻoihana uila, nā kaʻa, ka metallurgy, ke kila, nā ʻoihana kemika, a pēlā aku. | ||